科学研究:
主要研究领域:
宽禁带半导体ZnO和AlN单晶材料生长、缺陷和物性研究;冶金法提纯多晶硅技术及应用开发;高效太阳电池用低位错Ge单晶生长与缺陷控制;大直径InAs单晶生长及材料性质。
承担科研项目情况:
( 1 ) 新型中长波红外探测器衬底GaSb和InAs单晶材料制备及应用, 主持, 市地级, 2018-03--2020-12
( 2 ) 面向红外探测应用的GaSb单晶杂质、缺陷及物性研究, 主持, 国家级, 2015-01--2018-12
( 3 ) 4-6英寸InP单晶VGF生长技术, 主持, 院级, 2017-03--2019-12
( 4 ) 高质量GaSb单晶衬底加工技术及红外探测应用, 主持, 市地级, 2017-08--2018-12
( 5 ) 磷化铟材料, 主持, 国家级, 2019-10--2022-09
( 6 ) 高纯磷化铟多晶制备技术及晶园衬底制备, 主持, 院级, 2020-01--2020-12
主要学术成绩:
通过实验研究揭示了原生磷化铟材料中氢-铟空位复合体缺陷的形成规律以及与材料电学补偿和热生缺陷的关系。通过研究和比较纯磷和磷化铁气氛下高温退火处理磷化铟材料后产生的深能级缺陷,发现了与退火过程中原子扩散有关的缺陷产生与抑制现象并给出了物理解释。在此基础上证明这些深能级缺陷大部分与铟空位有关。同时掌握了抑制深能级缺陷产生、制备高质量半绝缘磷化铟材料的物理机理和技术途径。对影响晶体完整性的因素进行了全面的分析研究,包括微缺陷的成因、结构位错的形成原因以及所产生的晶格畸变、点缺陷对晶格完整性的影响等。这些研究成果有效促地进了高质量磷化铟等材料单晶生长技术和单晶衬底制备技术的提高。
1 化合物半导体晶体生长用高纯石英器件研发及产业化 濮阳坤;赵有文;张尧;陶明顿;庞海涛;李爱霞 连云港福东正佑照明电器有限公司 2017
2 6英寸VGF法锗单晶片生产关键工艺技术研究 惠峰;李苏滨;柳廷龙;钟文;李雪峰;吕春富;董汝昆;肖祥江;赵有文;高永亮;董志远;赵燕;张丹;段鑫敏;李明宣 云南中科鑫圆晶体材料有限公司 2016
3 以冷坩埚技术为寄出的光伏级多晶硅工业试验 董志远;赵有文;杨俊;王俊;段满龙;杨凤云;霍佃鑫;胡雪松;刘彤;罗龙 包头市山晟新能源有限责任公司 2012
4 深紫外LED用AlGaN材料生长研究 王军喜;赵有文;刘喆;闫建昌;马平 中国科学院半导体研究所 2008
5 半导体光电功能材料磷化铟、氮化镓和氧化锌的特性研究 许小亮;赵有文;施朝淑 中国科学技术大学 2003
6 Ⅲ-Ⅴ族和Ⅱ-Ⅵ族半导体电学输运和发光特性的研究 许小亮;赵有文;施朝淑;刘洪图 中国科学技术大学 2003
制定标准:
1 磷化铟多晶 GB/T 36706-2018 2019-07-17 国家标准
2 LED外延芯片用磷化镓衬底 GB/T 30855-2014 2015-04-30 国家标准
3 LED外延芯片用砷化镓衬底 GB/T 30856-2014 2015-04-30 国家标准
4 太阳能电池用砷化镓单晶 GB/T 25075-2010 2012-03-13 国家标准
5 化合物半导体抛光晶片亚表面损伤的反射差分谱测试方法 GB/T 26070-2010 2012-03-13 国家标准
发明专利:
[1]刘丽杰,赵有文,段满龙,刘鹏,王书怡. 一种磷化铟晶片的清洗方法[P]. CN113690128A,2021-11-23.
[2]赵有文,段满龙,刘鹏,卢伟,杨俊,刘京明,谢辉. 一种基于VGF法的气相掺杂的晶体生长方法[P]. CN111041550B,2021-10-12.
[3]何建军,赵有文,沈桂英,刘京明. 一种硅磷合金的制备方法[P]. CN113371714A,2021-09-10.
[4]牛智川,李农,刘冰,徐应强,王国伟,蒋洞微,吴东海,郝宏玥,赵有文,朱小贵,何胜. 在GaSb衬底上生长InAs层的生长速度测定方法[P]. CN113358677A,2021-09-07.
[5]周媛,赵有文,谢辉,杨俊,沈桂英,刘京明. 一种去除锑化镓单晶片残余应力的退火方法[P]. CN112899790A,2021-06-04.
[6]刘京明,赵有文. 一种低浓度P型磷化铟单晶的制备方法[P]. CN109629003B,2021-05-28.
[7]赵有文,段满龙. 对VGF法生产的InP晶锭进行籽晶、引晶及结晶情况判定的方法[P]. CN109629002B,2021-03-16.
[8]沈桂英,赵有文,孙静,刘京明,余丁,谢辉. 砷化铟单晶片位错腐蚀液及位错腐蚀检测方法[P]. CN110205681B,2020-12-15.
[9]赵有文,沈桂英,段满龙,杨俊,卢伟,刘鹏. 基于VGF法晶体生长用石英封帽以及晶体生长装置[P]. CN211620660U,2020-10-02.
[10]谢辉,赵有文,董志远,刘京明. 一种降低半绝缘磷化铟单晶掺铁浓度的方法[P]. CN108456928B,2020-09-22.
[11]白永彪,赵有文,沈桂英,董志远,刘京明,谢晖,余丁. 籽晶保护装置及单晶生长方法[P]. CN108546986B,2020-09-15.
[12]刘彤,杨俊,刘京明,董志远,赵有文. 一种锑化镓单晶抛光片的清洗方法[P]. CN105405746B,2020-09-11.
[13]赵有文,卢伟,段满龙,杨俊,刘京明. 一种基于VGF法的晶体生长用双层壁坩埚[P]. CN211005709U,2020-07-14.
[14]赵有文,段满龙,卢伟,杨俊,刘京明. 一种晶体生长装置[P]. CN211005717U,2020-07-14.
[15]余丁,赵有文,白永彪,沈桂英,董志远,刘京明,谢辉. 背表面场GaSb热光伏电池及其制备方法[P]. CN108831933B,2020-05-12.
[16]赵有文,段满龙,刘鹏,卢伟,杨俊,刘京明,谢辉. 一种基于VGF法的气相掺杂的晶体生长方法[P]. CN111041550A,2020-04-21.
[17]孙静,赵有文,谢辉,沈桂英,董志远,刘京明,周媛. 掺硫砷化铟体单晶片、其腐蚀方法及腐蚀剂[P]. CN110965129A,2020-04-07.
[18]赵有文,沈桂英,段满龙,杨俊,卢伟,刘鹏. 基于VGF法晶体生长用石英封帽、晶体生长装置及晶体生长工艺[P]. CN110952133A,2020-04-03.
[19]段满龙,赵有文,杨俊,刘京明,卢伟. 一种晶体生长后的退火及脱锅方法以及晶体制备方法[P]. CN110725008A,2020-01-24.
[20]段满龙,赵有文. 晶体生长的加热装置及生长装置[P]. CN209584423U,2019-11-05.
[21]赵有文,段满龙. 晶体生长用双层坩埚[P]. CN209537670U,2019-10-25.
[22]沈桂英,赵有文,孙静,刘京明,余丁,谢辉. 砷化铟单晶片位错腐蚀液及位错腐蚀检测方法[P]. CN110205681A,2019-09-06.
[23]陶明顿,濮阳坤,赵有文,庞海涛,张尧. 一种紫色石英管及其制备方法[P]. CN106186685B,2019-06-28.
[24]李雪峰,赵有文. 改善晶片主定位边立面加工中出现缺陷的方法[P]. CN109808085A,2019-05-28.
[25]陶明顿,濮阳坤,赵有文,庞海涛,张尧. 一种黄色石英管及其制备方法[P]. CN106219970B,2019-05-21.
[26]陶明顿,濮阳坤,赵有文,庞海涛,张尧. 一种灰色石英管及其制备方法[P]. CN106219971B,2019-05-21.
[27]陶明顿,濮阳坤,赵有文,庞海涛,张尧. 一种红色石英管及其制备方法[P]. CN106219972B,2019-05-21.
[28]赵有文,段满龙. 对VGF法生产的InP晶锭进行籽晶、引晶及结晶情况判定的方法[P]. CN109629002A,2019-04-16.
[29]刘京明,赵有文. 一种低浓度P型磷化铟单晶的制备方法[P]. CN109629003A,2019-04-16.
[30]段满龙,赵有文. 晶体生长的加热装置及生长装置[P]. CN109594124A,2019-04-09.
[31]谢辉,赵有文. 一种晶体生长方法[P]. CN109576776A,2019-04-05.
[32]赵有文,段满龙. 晶体生长用双层坩埚及晶体生长工艺[P]. CN109576777A,2019-04-05.
[33]余丁,赵有文,白永彪,沈桂英,董志远,刘京明,谢辉. 背表面场GaSb热光伏电池及其制备方法[P]. CN108831933A,2018-11-16.
[34]白永彪,赵有文,沈桂英,董志远,刘京明,谢晖,余丁. 籽晶保护装置及单晶生长方法[P]. CN108546986A,2018-09-18.
[35]谢辉,赵有文,董志远,刘京明. 一种提高半绝缘磷化铟单晶片电阻率均匀性的方法[P]. CN108486658A,2018-09-04.
[36]谢辉,赵有文,董志远,刘京明. 一种降低半绝缘磷化铟单晶掺铁浓度的方法[P]. CN108456928A,2018-08-28.
[37]谢辉,赵有文,董志远,刘京明. 一种降低半绝缘磷化铟单晶深能级补偿缺陷的方法[P]. CN108385167A,2018-08-10.
[38]沈桂英,赵有文,白永彪,刘京明,谢辉. 一种制备P型锰掺杂的砷化铟单晶的方法[P]. CN108085744A,2018-05-29.
[39]段满龙,董志远,赵有文,杨俊. 一种磷化铟的合成方法及其合成装置[P]. CN107937984A,2018-04-20.
[40]赵有文,王俊,董志远,刘京明. 用于磷化铟晶片的下盘方法[P]. CN107910246A,2018-04-13.
[41]赵有文,董志远,杨俊,段满龙. 富铟磷化铟多晶料的循环利用方法[P]. CN107829141A,2018-03-23.
[42]赵有文,段满龙,卢伟,谢辉. 消除InP晶片微缺陷的方法[P]. CN107829142A,2018-03-23.
[43]赵有文,刘京明,段满龙,董志远,刘刚. 一种晶片研磨装置[P]. CN107756232A,2018-03-06.
[44]段满龙,赵有文,杨俊,卢伟. 一种掺铁磷化铟单晶片的退火方法[P]. CN107675262A,2018-02-09.
[45]赵有文,段满龙. 磷化铟多晶水平合成装置[P]. CN206916255U,2018-01-23.
[46]苏杰,刘彤,刘京明,赵有文. 采用闭管化学气相传输方式生长Ga2O3单晶的方法[P]. CN107400919A,2017-11-28.
[47]陈晓玉,赵有文. 太阳能电池减反钝化膜及其制备方法及太阳能电池片[P]. CN107068774A,2017-08-18.
[48]杨翠柏,赵有文,段满龙,杨光辉,刘刚,刘京明,杨风云. 磷化铟晶锭切割(100)晶片的方法[P]. CN106863628A,2017-06-20.
[49]杨翠柏,赵有文,方聪,王凤华,董志远,高永亮,王俊. 熔区附加磁场装置及具有其的VGF单晶生长炉[P]. CN206204471U,2017-05-31.
[50]杨翠柏,赵有文,段满龙,陈丙振,刘彤,卢伟,杨俊. 磷化铟多晶水平合成装置及压力平衡控制方法[P]. CN106757360A,2017-05-31.
[51]杨翠柏,赵有文,方聪,王凤华,董志远,高永亮,王俊. 熔区附加磁场装置及具有其的VGF单晶生长炉[P]. CN106498487A,2017-03-15.
[52]陶明顿,濮阳坤,赵有文,庞海涛,张尧. 一种黄色石英管及其制备方法[P]. CN106219970A,2016-12-14.
[53]陶明顿,濮阳坤,赵有文,庞海涛,张尧. 一种灰色石英管及其制备方法[P]. CN106219971A,2016-12-14.
[54]陶明顿,濮阳坤,赵有文,庞海涛,张尧. 一种红色石英管及其制备方法[P]. CN106219972A,2016-12-14.
[55]赵有文,段满龙,尹朝蓉,尹文斌,孙勇. 一种棒状砷的制备方法[P]. CN106222452A,2016-12-14.
[56]陶明顿,濮阳坤,赵有文,庞海涛,张尧. 一种紫色石英管及其制备方法[P]. CN106186685A,2016-12-07.
[57]庞海涛,赵有文,濮阳坤,庄子柱,王婧姝,李骏. 石英连熔炉芯杆气压稳定装置[P]. CN205710395U,2016-11-23.
[58]刘京明,刘彤,董志远,赵有文. 一种控制GaSb单晶衬底表面颗粒度的方法[P]. CN106119972A,2016-11-16.
[59]刘京明,刘彤,董志远,赵有文. 一种GaSb单晶衬底表面化学钝化的方法[P]. CN106057663A,2016-10-26.
[60]庞海涛,赵有文,濮阳坤,庄子柱,王婧姝,李骏. 石英连熔炉芯杆气压稳定装置[P]. CN105923980A,2016-09-07.
[61]刘京明,杨俊,刘彤,董志远,赵有文. 一种生长氮化铝单晶用坩埚[P]. CN205223407U,2016-05-11.
[62]刘京明,刘彤,杨俊,董志远,赵有文. 一种氮化铝单晶的位错腐蚀方法[P]. CN105483833A,2016-04-13.
[63]刘彤,杨俊,刘京明,董志远,赵有文. 一种锑化镓单晶抛光片的清洗方法[P]. CN105405746A,2016-03-16.
[64]刘彤,杨俊,刘京明,董志远,赵有文. 一种锑化镓单晶抛光片腐蚀液[P]. CN105349290A,2016-02-24.
[65]曹可慰,赵有文. 偏[111]晶向锗单晶片位错显示用腐蚀液及腐蚀方法[P]. CN104862702A,2015-08-26.
[66]刘京明,刘彤,董志远,赵有文,李百泉. 一种用于高温感应加热炉的坩埚支撑架[P]. CN204530020U,2015-08-05.
[67]刘彤,杨俊,刘京明,董志远,赵有文. 一种气相法生长氮化铝晶体用原料的制备方法[P]. CN103643295A,2014-03-19.
[68]刘京明,刘彤,杨俊,董志远,赵有文. 一种用于高温气相法晶体生长的TaC坩埚的制备方法[P]. CN103643305A,2014-03-19.
[69]刘京明,赵有文,王凤华,杨凤云. 降低衬底表面残留杂质浓度的方法[P]. CN103021833A,2013-04-03.
[70]谢辉,赵有文. ZnO体单晶的Sb离子注入掺杂及退火激活方法[P]. CN102691108A,2012-09-26.
[71]陈腾,赵有文. 多晶硅碱性制绒方法[P]. CN102437044A,2012-05-02.
[72]赵有文,惠峰,高永亮,朱蓉辉. 半导体晶片精密化学机械抛光剂[P]. CN102234484A,2011-11-09.
[73]惠峰,赵有文,朱蓉辉,高永亮. 一种精密抛光晶片用有机物清洗液[P]. CN102234595A,2011-11-09.
[74]惠峰,赵有文,朱蓉辉,高永亮. 精密多线切割和研磨用切磨粉体材料[P]. CN102234500A,2011-11-09.
[75]惠峰,赵有文,朱蓉辉. 多线切割载荷控制方法[P]. CN102233620A,2011-11-09.
[76]惠峰,赵有文,朱蓉辉,高永亮. 双面抛光机[P]. CN201776693U,2011-03-30.
[77]赵有文,惠峰,高永亮,朱蓉辉. 扩散型兆声波清洗槽[P]. CN201720213U,2011-01-26.
[78]惠峰,赵有文,朱蓉辉. 晶片工艺卡具[P]. CN201699002U,2011-01-05.
[79]惠峰,赵有文,朱蓉辉,高永亮. 一种片状材料厚度测量装置[P]. CN201653324U,2010-11-24.
[80]占荣,惠峰,赵有文. 生长半绝缘砷化镓的石英管及在砷化镓中掺碳的方法[P]. CN101603208,2009-12-16.
[81]董志远,赵有文,杨俊,段满龙. 氧化锌体单晶生长过程中的直接掺杂方法[P]. CN101440516,2009-05-27.
[82]董志远,赵有文,杨俊,段满龙. 动态控制高温炉内压力的方法[P]. CN101440517,2009-05-27.
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[86]董宏伟,赵有文,杨子祥,焦景华. 磷化铟单晶片的抛光工艺[P]. CN1402309,2003-03-12.
论文专著:
发表期刊论文:
[1]冯银红,沈桂英,赵有文,刘京明,杨俊,谢辉,何建军,王国伟.无位错Te-GaSb(100)单晶抛光衬底的晶格完整性[J].人工晶体学报,2022,51(06):1003-1011.
[2]刘丽杰,赵有文,黄勇,赵宇,王俊,王应利,沈桂英,谢辉.面向MOCVD生长InAs/GaSb超晶格红外探测的InAs衬底表面制备(英文)[J].红外与毫米波学报,2022,41(02):420-424.
[3]Zhao, Youwen.Evaluation of residual stress in InP and InAs (100) substrates obtained from single crystals grown by LEC and VGF methods), Mater. Sci. Semicond. Pro., 2021, 通讯作者
[4]Zhao, Youwen.Residual stress distribution and flatness of dislocation-free Te-GaSb (100) substrate, Jpn. J. Appl. Phys., 2021, 通讯作者
[5]Zhao, Youwen.Evaluation of LEC and VGF-InAs substrates through surface defect characyerization and epitaxy growth), Mater. Sci. Semicond. Pro., 2021, 第 2 作者
[6]刘京明,赵有文.BAs晶体生长研究进展[J].人工晶体学报,2021,50(02):391-396.
[7] Zhao, Youwen.HCl-H2SO4-H2O solution etching behavior of InAs (100) surface, Journal of Crystal Growth, 2020, 通讯作者
[8]Zhao, Youwen. VGF growth of high quality InAs single crystals with low low dislocation density, Journal of Crystal Growth, 2020, 第 8 作者
[9]Zhao, Youwen.A comparison of defects between InAs single crystals grown by Le\EC and VGF methods, Journal of Electronic Materials, 2020, 第 2 作者
[10]刘丽杰,吴远大,王玥,王亮亮,安俊明,赵有文.面向长距离通讯1550 nm垂直腔面发射激光器的研究(英文)[J].红外与毫米波学报,2020,39(04):397-400.
[11]余丁,沈桂英,谢辉,刘京明,孙静,赵有文.Mechanism of free electron concentration saturation phenomenon in Te-GaSb single crystal[J].Chinese Physics B,2019,28(05):267-271, 通讯作者
[12]Zhao, Youwen. Electrical conduction of carbon-ion-implanted InAs, Mater. Res. express, 2019, 通讯作者
[13]Zhao, Youwen Wet etching generation of dislocation pits with clear facets in LEC-InAs, Journal of Crystal Growth, 2019, 通讯作者
[14]Zhao, Youwen.Photoluminescene study acceptor defects in lightly doped n type, Journal of Semiconductors, 2019, 第 2 作者
[15] Zhao, Youwen.impurity band conduction in Mn-doped p type InAs single crystal, Materials Science in Semiconductor Processing, 2018, 第 2 作者
[16]Zhao, Youwen. LVM Spectroscopy Investigation of Complex Defects in InAs single crystals grown by the LEC Method, Journal of Electronic materials, 2018, 第 2 作者
[17]Zhao, Youwen 退火Te-GaSb的电学性质, Electrical and optical property of annealed Te-doped GaSb, Journal of Semiconductors, 2017, 通讯作者
[18]赵有文,段满龙,卢伟,杨俊,董志远,刘刚,高永亮,杨凤云,王风华,王俊,刘京明,谢辉,王应利,卢超. 4 inch低位错密度InP单晶的VGF生长及性质研究[J]. VGF growth of 4 inch diameter InP with low dislocation density and property investigation, 人工晶体学报, ,2017,46(05):792-796.
[19]杨俊,段满龙,卢伟,刘刚,高永亮,董志远,王俊,杨凤云,王凤华,刘京明,谢辉,王应利,卢超,赵有文.4英寸低位错密度GaSb单晶生长及高质量衬底制备, growth of 4 inch diameter GaSb single crystal with low dislocation density and high quality substrate preparation, 人工晶体学报,2017,46(05):820-824. 通讯作者
[20] 通过消除原生缺陷提高InAs单晶的透光率, Enhancement of below gap transmission of InAs single crystal via suppression of native defects, Mater. Res. Express, 2017, 通讯作者
[21]Bai Yong-Biao; Zhao You-Wen*; Shen Gui-Ying; Chen Xiao-Yu; Liu Jing-Ming; Xie Hui; Dong Zhi-Yuan; Yang Jun; Yang Feng-Yun; Wang Feng-Hua.N-type GaSb single crystals with high below-band gap transmission[J].Chinese Physics B,2017,26(10):446-449.通讯作者
[22]陈晓玉,刘彤,刘京明,谢辉,赵有文,董志远,马承红,和江变.晶硅太阳电池黑斑分析[J].半导体光电,2017,38(01):21-25.
[23]苏杰,刘彤,刘京明,杨俊,沈桂英,白永彪,董志远,赵有文.Carbon agent chemical vapor transport growth of Ga2O3 crystal[J].Journal of Semiconductors,2016,37(10):47-51.通讯作者
[24]Performance improvement of c-Si solar cell by a combination of SiNx/SiOx passivation and double P-diffusion gettering treatment, Journal of Semiconductors, 2017, 通讯作者
[25]晶硅电池的黑斑缺陷, black spot defect in c-Si solar cell, 半导体光电, 2016, 通讯作者
[26]苏杰,刘彤,刘京明,杨俊,白永彪,沈桂英,董志远,王芳芳,赵有文.Thermally induced native defect transform in annealed GaSb[J].Chinese Physics B,2016,25(07):454-458.
[27]曹可慰,刘彤,刘京明,谢辉,陶东言,赵有文,董志远,惠峰.Evaluation of four inch diameter VGF-Ge substrates used for manufacturing multi-junction solar cell[J].Journal of Semiconductors,2016,37(06):25-30.
[28]程雨,刘京明,苏杰,刘彤,杨凤云,董志远,赵有文.GaSb晶片表面残留杂质分析[J].半导体光电,2016,37(01):55-58.
[29]曹可慰,刘彤,刘京明,谢辉,陶东言,赵有文,董志远,惠峰. Evaluation of four inch diameter VGF-Ge substrates used for manufacturing multi-junction solar cell[J]. 半导体学报:英文版,2016,0(6).
[30]苏杰,刘彤,刘京明,杨俊,沈桂英,白永彪,董志远,赵有文. Carbon agent chemical vapor transport growth of Ga2O3 crystal[J]. .Journal of Semiconductors,2016,37(10):47-51.
[31]Xie Hui; Zhao Youwen*; Liu Tong; Dong Zhiyuan; Yang Jun; Liu Jingming..C-H complex defects and their influence in ZnO single crystal[J].Chinese Physics B,2015,24(10):511-513., 通讯作者
[32]Tao Dongyan*; Cheng Yu; Liu Jingming; Su Jie; Liu Tong; Yang Fengyun; Wang Fenghua; Cao Kewei; Dong Zhiyuan; Zhao Youwen.Chemical and electrical properties of(NH4)2S passivated GaSb surface[J].Journal of Semiconductors,2015,36(07):49-53.
[33]Xie Hui*; Liu Tong; Liu Jingming; Cao Kewei; Dong Zhiyuan; Yang Jun; Zhao Youwen。Implantation induced defects and electrical properties of Sb-implanted ZnO.SCIENCE CHINA-TECHNOLOGICAL SCIENCES, 2015, 58(8): 1333-1118.
[34]Dongyan Tao; Yu Cheng; Jingming Liu; Jie Su; Tong Liu; Fengyun Yang; Fenghua Wang; Kewei Cao; Zhiyuan Dong; Youwen Zhao*.Improved surface and electrical properties of passivated GaSb with less alkaline sulfi de solution. Materials Sciencein Semiconductor Processing, 2015, 40: 685-689.
[35]Zhao, Youwen.GaSb原生缺陷的热致转变, Thermally induced native defect transform in annealed GaSb, Chin. Phys. B, 2015, 通讯作者
[36]Zhao, Youwen.Improved surface and electrical properties of passivated GaSb with lessalkaline sulfi de solution,, Materials Science in Semiconductor Processing, 2015, 通讯作者
[37]IZhao, Youwen.mplantation induced defects and electrical properties of Sb-implanted ZnO, SCIENCE CHINA Technological Sciences, 2015, 第 4 作者
[38]Zhao, Youwen.Evaluation of four inch diameter VGF-Ge substrate used for manufacturing Multi-junction Solar Cell, Journal of Semiconductor, 2015, 通讯作者
[39]程雨,刘京明,刘彤,苏杰,杨凤云,董志远,赵有文.不同晶向GaSb晶片表面化学组分及形貌分析[J].半导体光电,2015,36(06):922-924+938.
[40]刘京明,刘彤,杨俊,陶东言,段满龙,董志远,赵有文,李百泉.AlN原料的钨网炉高温提纯[J].材料科学与工程学报,2015,33(04):601-604.
[41] Chen, Teng*; Zhao, Youwen; Dong, Zhiyuan; Yang, Jun; Liu, Tong. Synthesis of chalcopyrite CuIn1-xGaxSe2 alloys for photovoltaic application by a novel melting method.Materials Letters, 2013, 106: 52-55.
[42]Liu, Jingming*; Zhao, Youwen; Dong, Zhiyuan; Yang, Fengyun; Wang, Fenghua; Cao, Kewei; Liu, Tong; Xie, Hui; Chen, Teng. Improvement of the surface quality of semi-insulating InP substrates through a novel etching and cleaning method.Journal of Vacuum Science and Technology A, 2013, 31(3): 031404.
[43]Chen, Teng*; Zhao, Youwen; Dong, Zhiyuan; Liu, Tong; Wang, Jun; Xie, Hui. Analysis of solar cells fabricated from UMG-Si purified by a novel metallurgical method.Semiconductor Science and Technology, 2013, 28(1): 015024.
[44]Liu, Tong*; Dong, Zhiyuan; Zhao, Youwen; Wang, Jun; Chen, Teng; Xie, Hui; Li, Jian; Ni, Haijiang; Huo, Dianxin.Purification of metallurgical silicon through directional solidification in a large cold crucible.Journal of Crystal Growth, 2012, 355(1): 145-150.
[45]Liu, Tong*; Dong, Zhiyuan; Zhao, Youwen; Wang, Jun; Chen, Teng; Xie, Hui; Li, Jian; Ni, Haijiang; Huo, Dianxin.Large scale purification of metallurgical silicon for solar cell by using electron beam melting.Journal of Crystal Growth, 2012, 351(1): 19-22.
[46]Li Hui*; Zhou Kai; Pang Jingbiao; Shao Yundong; Wang Zhu; Zhao Youwen. Defect properties of as-grown and electron-irradiated Te-doped GaSb studied by positron annihilation , Semiconductor Science and Technology, 2011, 26(7): 075016. , 通讯作者
[47]赵有文; 杨凤云; 段满龙; 孙文荣; 董志远; 杨俊; 胡炜杰; 刘刚; 王俊; 王应利.高质量化合物InP、GaSb和InAs开盒即用单晶衬底制备.第十六届全国化合物半导体材料、微波器件和光电器件学术会议, 2010-10-25.
[48]陈燕,邓爱红,赵有文,张英杰,余鑫祥,喻菁,龙娟娟,周宇璐,张丽然.非掺半绝缘InP材料的电子辐照缺陷研究[J].四川大学学报(自然科学版),2010,47(05):1069-1072.
[49]胡炜杰,赵有文,段满龙,王应利,王俊.InAs单晶衬底的表面形貌和化学成分分析[J].人工晶体学报,2010,39(04):878-882.
[50]胡炜杰,赵有文,孙文荣,段满龙,董志远,杨俊.Residual impurities and electrical properties of undoped LEC InAs single crystals[J].半导体学报,2010,31(04):1-4.
[51]Zhao, Youwen.Donor defect in P-diffused bulk ZnO single crystal , AIP Conference Proceedings, 2009, 第 1 作者
[52]Li, Hui; Wang, Zhu*; Zhou, Kai; Pang, Jingbiao; Ke, Junyu; Zhao, Youwen. Proton irradiation-induced defects in undoped GaSb studied by positron lifetime spectroscopy and photoluminescence. Journal of Optoelectronics and Advanced Materials, 2009, 11(8): 1122-1126.
[53]李巍巍,赵有文,董志远,杨俊,胡炜杰,客建红,黄艳,高振华.Luminescence spectroscopy of ion implanted AlN bulk single crystal[J].半导体学报,2009,30(08):31-33.
[54]李巍巍,赵有文,董志远,杨俊,胡炜杰,客建红.Wet etching and infrared absorption of AlN bulk single crystals[J].半导体学报,2009,30(07):27-30.
[55]孙聂枫,赵有文,孙同年.InP中的深能级杂质与缺陷(续)[J].微纳电子技术,2008(11):621-626.
[56]张瑞,张璠,赵有文,董志远,杨俊.掺Sb的ZnO单晶的缺陷和性质研究[J].Pan Tao Ti Hsueh Pao/chinese Journal of Semiconductors, 2008, (10): 1988-1991..
[57]孙聂枫,赵有文,孙同年.InP中的深能级杂质与缺陷[J].微纳电子技术,2008(10):559-567.
[58]张瑞,张璠,赵有文,董志远,杨俊.磷扩散氧化锌单晶的性质(英文)[J].半导体学报,2008(09):1674-1678.
[59]占荣,赵有文,于会永,高永亮,惠峰.高温退火处理提高半绝缘VGF-GaAs单晶的电学性能[J].半导体学报,2008(09):1770-1774.
[60]于会永,赵有文,占荣,高永亮,惠峰.VGF法生长的低位错掺Si-GaAs单晶的缺陷和性质[J].Pan Tao Ti Hsueh Pao/chinese Journal of Semiconductors, 2008, (09): 1775-1778..
[61]周立,陈涌海,王占国,赵有文.多晶AlN光学性质研究Optical Characteristics of Poly- crystalline AIN , [J].光散射学报,2008(03):245-248.
[62]张璠,赵有文,董志远,张瑞,杨俊.铟掺杂ZnO体单晶的生长及其性质[J].半导体学报,2008(08):1540-1543.
[63]王柱,柯君玉,李辉,庞锦标,戴益群,赵有文.用正电子研究原生ZnO单晶中的缺陷[J].武汉大学学报(理学版),2008(03):305-308.
[64]Zhao, Y. W.*; Dong, Z. Y.. Annihilation of deep level defects in InP through high temperature annealing.Journal of Physics and Chemistry of Solids, 2008, 69(2-3): 551-554.
[65]Wei, Xuecheng; Zhao, Youwen; Dong, Zhiyuan; Li, Jinmin.Investigation of native defects and property of bulk ZnO single crystal grown by a closed chemical vapor transport method. Journal of Crystal Growth, 2008, 310(3): 639-645.
[66]杨俊; 董志远; 胡炜杰; 段满龙; 赵有文 TaC坩埚制备及在AlN单晶生长中的应用.第十五届全国化合物半导体材料、微波器件和光电器件学术会议, 2008-11-30.
[67]李巍巍; 赵有文; 董志远; 杨俊; 胡炜杰 离子注入AlN单晶的荧光谱分析.第十五届全国化合物半导体材料、微波器件和光电器件学术会议, 2008-11-30.
[68]董志远; 赵有文; 杨俊; 胡炜杰 PVT法生长AlN单晶的杂质和缺陷分析. 第十五届全国化合物半导体材料、微波器件和光电器件学术会议, 2008-11-30.
[69]胡炜杰; 赵有文; 孙文荣; 段满龙; 董志远; 杨俊.非掺杂LEC-InAs单晶的残留杂质与电学性能研究. 第十五届全国化合物半导体材料、微波器件和光电器件学术会议, 2008-11-30.
[70]赵有文; 孙文荣; 段满龙; 董志远; 胡炜杰; 杨俊; 张金利; 王应利; 刘刚.化学配比对InP和InAs单晶完整性及衬底表面制备的影响.第十五届全国化合物半导体材料、微波器件和光电器件学术会议, 2008-11-30.
[71]Wei, Xuecheng; Zhao, Youwen; Dong, Zhiyuan; Li, Jinmin.Characterization of bulk ZnO single crystal grown by a CVT method - art. no. 68410F. Conference on Solid State Lighting and Solar Energy Technologies, China, 2007-11-12 to 2007-11-14.
[72]Zhao You-Wen*; Miao Shan-Shan; Dong Zhi-Yuan; Lue Xiao-Hong; Deng Ai-Hong; Yang Jun; Wang Bo. Thermally induced Fe atom transition from substitutional to interstitial sites in InP and its influence on material property. Acta Physica Sinica, 2007, 56(9): 5536-5541.
[73]Wang Bo; Zhao You-Wen*; Dong Zhi-Yuan; Deng Ai-Hong; Miao Shan-Shan; Yang Jun. Electron irradiation induced defects in high temperature annealed InP single crystal. Acta Physica Sinica, 2007, 56(3): 1603-1607.
[74]Zhao You-Wen*; Dong Zhi-Yuan.Generation and suppression of deep level defects in InP.Acta Physica Sinica, 2007, 56(3): 1476-1479.
[75]Shao, Y. D.; Wang, Z.*; Dai, Y. Q.; Zhao, Y. W.; Tang, F. Y..Identification of vacancies in electron irradiated GaSb by coincidence Doppler broadening spectroscopy.Materials Letters, 2007, 61(4-5): 1187-1189.
[76]Yang Jun; Zhao You-Wen*; Dong Zhi-Yuan; Deng Ai-Hong; Miao Shan-Shan; Wang Bo.Influence of deep level defects on electrical compensation in semi-insulating InP materials.Acta Physica Sinica, 2007, 56(2): 1167-1171.
[77]赵有文,苗杉杉,董志远,吕小红,邓爱红,杨俊,王博.磷化铟中铁原子替位与填隙的热致转变及其对材料性质的影响[J].物理学报,2007(09):5536-5541.
[78]魏学成,赵有文,董志远,李晋闽.气相输运法大尺寸ZnO单晶生长的传输过程控制[J].半导体学报,2007(06):869-872.
[79]赵有文,董志远.InP中深能级缺陷的产生与抑制现象[J].物理学报,2007(03):1476-1479.
[80]王博,赵有文,董志远,邓爱红,苗杉杉,杨俊.高温退火后非掺杂磷化铟材料的电子辐照缺陷[J].物理学报,2007(03):1603-1607.
[81]董志远,赵有文,魏学成,李晋闽.物理气相传输法生长大尺寸AlN晶体及其性质表征[J].半导体学报,2007(02):204-208.
[82]杨俊,赵有文,董志远,邓爱红,苗杉杉,王博.深能级缺陷对半绝缘InP材料电学补偿的影响[J].物理学报,2007(02):1167-1171.
[83]董志远,赵有文,魏学成,李晋闽.物理气相传输法生长大尺寸AlN晶体及其性质表征[J].半导体学报,2007(02):204-208.
[84]Y.W. Zhao, Z.Y. Dong, A.H. Deng , Electron irradiation-induced defects in InP pre-annealed at high temperature, Materials Science in Semiconductor Processing , 2006, 9(1-3): 380-383.
[85]Zhao, Youwen*; Dong, Zhiyuan; Miao, Shanshan; Deng, Aihong; Yang, Jun; Wang, Bo.Origin of deep level defect related photoluminescence in annealed InP.Journal of Applied Physics, 2006, 100(12): 123519.
[86]Zhao, YW*; Dong, ZY; Duan, ML; Sun, WR; Yang, ZX.Growth of high quality semi-insulating InP single crystal by suppression of compensation defects. Journal of Rare Earths, 2006, 24: 75-77.
[87]赵有文,董志远,孙文荣,段满龙,杨子祥,吕旭如.磷化铟单晶衬底的缺陷控制和高质量表面制备[J].半导体学报,2006(12):2127-2133.
[88]苗杉杉,赵有文,董志远,邓爱红,杨俊,王博.半绝缘InP的铁掺杂激活与电学补偿[J].半导体学报,2006(11):1934-1939.
[89]魏学成,赵有文,董志远,李晋闽.ZnO单晶的缺陷及其对材料性质的影响[J].半导体学报,2006(10):1759-1762.
[90]赵有文,孙文荣,段满龙,董志远,杨子祥,吕旭如,王应利.高质量InAs单晶材料的制备及其性质[J].半导体学报,2006(08):1391-1395.
[91]赵有文,董志远,魏学成,段满龙,李晋闽.升华法生长AlN体单晶初探[J].半导体学报,2006(07):1241-1245.
[92]赵有文,董志远,魏学成,段满龙,李晋闽.化学气相传输法生长ZnO单晶及性质研究[J].人工晶体学报,2006(02):404-408.
[93]赵有文,董志远,李成基,段满龙,孙文荣.半绝缘InP中深能级缺陷对电学性质的影响和缺陷的控制[J].半导体学报,2006(03):524-529.
[94]赵有文,董志远,魏学成,段满龙,李晋闽.化学气相传输法生长ZnO单晶[J].半导体学报,2006(02):336-339.
[95]邵云东,王柱,赵有文,唐方圆.用正电子研究半导体材料GaSb的缺陷[J].武汉大学学报(理学版),2006(01):35-39.
[96]赵有文; 董志远; 魏学成; 李晋闽.升华法生长大尺寸AlN体单晶材料. 第14届全国晶体生长与材料学术会议论文集.,2006:241.
[97]董志远; 赵有文; 魏学成; 李晋闽.籽晶对ZnO单晶化学气相传输生长过程和材料性质的影响[C].第14届全国晶体生长与材料学术会议论文集.,2006:115.
[98]赵有文; 孙文荣; 段满龙; 董志远; 杨子祥; 王应利.化合物InP、GaSb和InAs单晶材料的缺陷控制及高质量衬底制备[C].第14届全国晶体生长与材料学术会议论文集.,2006:37.
[99]Zhao, YW*; Dong, HW; Li, JM; Ling, LY.Photoluminescence characteristics of InP annealed in phosphorus and iron phosphide ambiences.Materials Science in Semiconductor Processing, 2005, 8(4): 531-535.
[100]Zhao, Y. W.*; Dong, Z. Y.; Li, Ch. J. Approach for defect suppression and preparation of high quality semi-insulating InP.Journal of Crystal Growth, 2005, 275(1-2).
[101]王柱; 胡卫国; 苏本法; 邵云东; 王少阶; 赵有文.用正电子湮没方法鉴别GaSb半导体中的缺陷.第九届全国正电子谱学会议论文集.,2005:165.
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